Invention Grant
- Patent Title: Method for making nanostructured surfaces
- Patent Title (中): 制造纳米结构表面的方法
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Application No.: US13142441Application Date: 2009-12-29
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Publication No.: US08460568B2Publication Date: 2013-06-11
- Inventor: Moses M. David , Ta-Hua Yu
- Applicant: Moses M. David , Ta-Hua Yu
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent James A. Baker
- International Application: PCT/US2009/069662 WO 20091229
- International Announcement: WO2010/078306 WO 20100708
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C25/68 ; C03C15/00 ; C23F1/00
Abstract:
A continuous method for making a nanostructured surface comprises (a) placing a substrate comprising a nanoscale mask on a cylindrical electrode in a vacuum vessel, (b) introducing etchant gas to the vessel at a predetermined pressure, (c) generating plasma between the cylindrical electrode and a counter-electrode, (d) rotating the cylindrical electrode to translate the substrate, and (e) anisotropically etching a surface of the substrate to provide anisotropic nanoscale features on the surface.
Public/Granted literature
- US20120012557A1 METHOD FOR MAKING NANOSTRUCTURED SURFACES Public/Granted day:2012-01-19
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