Invention Grant
- Patent Title: Method for producing regenerated target
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Application No.: US13141261Application Date: 2009-12-17
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Publication No.: US08460602B2Publication Date: 2013-06-11
- Inventor: Toshiya Yamamoto , Takanobu Miyashita , Osamu Itoh
- Applicant: Toshiya Yamamoto , Takanobu Miyashita , Osamu Itoh
- Applicant Address: JP Tokyo
- Assignee: Tanaka Holdings Co., Ltd
- Current Assignee: Tanaka Holdings Co., Ltd
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2008-332330 20081226
- International Application: PCT/JP2009/071055 WO 20091217
- International Announcement: WO2010/073964 WO 20100701
- Main IPC: B22F3/14
- IPC: B22F3/14

Abstract:
A sintering method with uniaxial pressing includes: a powder filling step of disposing a spent target in an inner space of a frame jig having the inner space piercing in a uniaxial direction, and filling the inner space with a raw material powder for a target to cover an erosion part side of the spent target with the raw material powder for a target, a cushioning-material disposition step of disposing a deformable cushioning material so that the raw material powder for a target with which the inner space has been filled in the powder filling step is sandwiched between the spent target and the deformable cushioning material; and a sintering step of pressing the raw material powder for a target with which the inner space has been filled and the spent target in the uniaxial direction through the cushioning material and sintering them.
Public/Granted literature
- US20110256013A1 METHOD FOR PRODUCING REGENERATED TARGET Public/Granted day:2011-10-20
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