Invention Grant
- Patent Title: Hard coating layer and method for forming the same
- Patent Title (中): 硬涂层及其形成方法
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Application No.: US12997082Application Date: 2009-03-31
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Publication No.: US08460803B2Publication Date: 2013-06-11
- Inventor: Kenji Yamamoto , Albir A. Layyous
- Applicant: Kenji Yamamoto , Albir A. Layyous
- Applicant Address: JP Kobe-shi IL Tefen
- Assignee: Kabushiki Kaisha Kobe Seiko Sho,Iscar Ltd.
- Current Assignee: Kabushiki Kaisha Kobe Seiko Sho,Iscar Ltd.
- Current Assignee Address: JP Kobe-shi IL Tefen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-150662 20080609
- International Application: PCT/JP2009/056706 WO 20090331
- International Announcement: WO2009/150887 WO 20091217
- Main IPC: B32B9/00
- IPC: B32B9/00

Abstract:
Disclosed is a crystalline hard coating layer having no cracks, which exhibits both high hardness and excellent wear resistance at the same time. A method for forming the hard coating layer is also disclosed. A crystalline hard coating layer (3) coating a substrate (2) is formed by a PVD method, and contains Si and C as essential components, while containing an element M (which is one or more elements selected from among group 3A elements, group 4A elements, group 5A elements, group 6A elements, B, Al and Ru) and N as optional components. The crystalline hard coating layer (3) has the following composition: SixC1-x-y-zNyMz (where 0.4≦x≦0.6, 0≦y≦0.1, and 0≦z≦0.2).
Public/Granted literature
- US20110086233A1 HARD COATING LAYER AND METHOD FOR FORMING THE SAME Public/Granted day:2011-04-14
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