Invention Grant
- Patent Title: Method for making a thin-film structure and resulting thin-film structure
- Patent Title (中): 制造薄膜结构和所得薄膜结构的方法
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Application No.: US12091857Application Date: 2006-10-25
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Publication No.: US08461031B2Publication Date: 2013-06-11
- Inventor: Joël Eymery , Pascal Pochet
- Applicant: Joël Eymery , Pascal Pochet
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Brinks Hofer Gilson & Lione
- Priority: FR0511079 20051028
- International Application: PCT/FR2006/002400 WO 20061025
- International Announcement: WO2007/048928 WO 20070503
- Main IPC: H01L21/265
- IPC: H01L21/265 ; H01L21/02 ; H01L29/02
Abstract:
A method for making a thin-film structure includes a thin film stabilized on a substrate. The structure of the thin film is defined by a material which includes at least one first chemical species. The method includes a step of inputting particles of the first chemical species into the thin film so as to compensate for the flow of vacancies from the surface of the film.
Public/Granted literature
- US20080290471A1 Method For Making a Thin-Film Structure and Resulting Thin-Film Structure Public/Granted day:2008-11-27
Information query
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