Invention Grant
- Patent Title: Method for fabricating interconnections with carbon nanotubes
- Patent Title (中): 制造与碳纳米管互连的方法
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Application No.: US13094388Application Date: 2011-04-26
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Publication No.: US08461037B2Publication Date: 2013-06-11
- Inventor: Hsin-wei Wu , Chung-Min Tsai , Tri-Rung Yew
- Applicant: Hsin-wei Wu , Chung-Min Tsai , Tri-Rung Yew
- Applicant Address: TW Hsinchu
- Assignee: National Tsing Hua University
- Current Assignee: National Tsing Hua University
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW99141452A 20101130
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for fabricating interconnections with carbon nanotubes of the present invention comprises the following steps: forming a dual-layer that contains a catalytic layer and an upper covering layer on the periphery of a hole connecting with a substrate; and growing carbon nanotubes on the catalytic layer with the upper covering layer covering the carbon nanotubes. The present invention grows the carbon nanotubes between the catalytic layer and the upper covering layer. The upper covering layer protects the catalytic layer from being oxidized and thus enhances the growth of the carbon nanotubes. The carbon nanotubes are respectively connected with the lower substrate and an upper conductive wire via the catalytic layer and the upper covering layer, which results in a lower contact resistance. Moreover, the upper covering layer also functions as a metal-diffusion barrier layer to prevent metal from spreading to other materials via diffusion or other approaches.
Public/Granted literature
- US20120135598A1 METHOD FOR FABRICATING INTERCONNECTIONS WITH CARBON NANOTUBES Public/Granted day:2012-05-31
Information query
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