Invention Grant
- Patent Title: Ion beam irradiation device and method for suppressing ion beam divergence
- Patent Title (中): 离子束照射装置及离子束发散抑制方法
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Application No.: US13377253Application Date: 2010-04-27
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Publication No.: US08461548B2Publication Date: 2013-06-11
- Inventor: Dan Nicolaescu , Shigeki Sakai , Junzo Ishikawa , Yasuhito Gotoh
- Applicant: Dan Nicolaescu , Shigeki Sakai , Junzo Ishikawa , Yasuhito Gotoh
- Applicant Address: JP Kyoto-shi JP Kyoto-shi
- Assignee: Nissin ION Equipment Co., Ltd.,Kyoto University
- Current Assignee: Nissin ION Equipment Co., Ltd.,Kyoto University
- Current Assignee Address: JP Kyoto-shi JP Kyoto-shi
- Agency: Alleman Hall McCoy Russell & Tuttle LLP
- Priority: JP2009-158255 20090611
- International Application: PCT/JP2010/057405 WO 20100427
- International Announcement: WO2010/143479 WO 20101216
- Main IPC: H01J3/26
- IPC: H01J3/26

Abstract:
To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.
Public/Granted literature
- US20120085918A1 ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIVERGENCE Public/Granted day:2012-04-12
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