Invention Grant
US08461569B2 Semiconductor device and a method of fabricating a semiconductor device 失效
半导体器件和半导体器件的制造方法

Semiconductor device and a method of fabricating a semiconductor device
Abstract:
A semiconductor device includes a quantum dot and a plurality of layers, wherein said plurality of layers includes: a first layer; a stressor layer; and a patterned layer wherein said stressor layer overlies said first layer and said patterned layer overlies said stressor layer; wherein said stressor layer has a substantially different lattice constant to said first layer and said patterned layer and has a pit provided in said layer; said quantum dot lying above said patterned layer aligned with said pit.
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