Invention Grant
- Patent Title: Thin film transistor and manufacturing method thereof
- Patent Title (中): 薄膜晶体管及其制造方法
-
Application No.: US13052971Application Date: 2011-03-21
-
Publication No.: US08461633B2Publication Date: 2013-06-11
- Inventor: Jeong-Hwan Kim , Joung-Keun Park , Jae-Hyuk Jang
- Applicant: Jeong-Hwan Kim , Joung-Keun Park , Jae-Hyuk Jang
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Christie, Parker & Hale, LLP
- Priority: KR10-2010-0103551 20101022
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A thin film transistor includes a substrate; a gate electrode on the substrate; a gate insulating layer covering the gate electrode; a semiconductor layer corresponding to the gate electrode on the gate insulating layer; a protective layer covering the semiconductor layer and the gate insulating layer and having a source contact hole and a drain contact hole exposing a portion of the semiconductor layer; and a source electrode and a drain electrode on the protective layer and coupled to the semiconductor layer through the source contact hole and the drain contact hole, respectively, wherein the semiconductor layer has a source offset groove at a portion corresponding to the source contact hole of the protective layer.
Public/Granted literature
- US20120097947A1 THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-04-26
Information query
IPC分类: