Invention Grant
- Patent Title: Interconnect structure and a method of fabricating the same
- Patent Title (中): 互连结构及其制造方法
-
Application No.: US12741582Application Date: 2008-10-21
-
Publication No.: US08462516B2Publication Date: 2013-06-11
- Inventor: Chee Khuen Stephen Wong , Hock Lye John Pang , Wei Fan , Haijing Lu , Boon Keng Lok
- Applicant: Chee Khuen Stephen Wong , Hock Lye John Pang , Wei Fan , Haijing Lu , Boon Keng Lok
- Applicant Address: SG Singapore SG Singapore
- Assignee: Agency for Science Technology and Research,Nanyang Technological University
- Current Assignee: Agency for Science Technology and Research,Nanyang Technological University
- Current Assignee Address: SG Singapore SG Singapore
- Agency: King & Spalding LLP
- Priority: SG200717535-9 20071106
- International Application: PCT/SG2008/000406 WO 20081021
- International Announcement: WO2009/061282 WO 20090514
- Main IPC: H05K7/02
- IPC: H05K7/02 ; H05K1/16 ; H05K7/20 ; H05K1/09 ; B29C59/00

Abstract:
An interconnect structure, an interconnect structure for interconnecting first and second components, an interconnect structure for interconnecting a multiple component stack and a substrate, and a method of fabricating an interconnect structure. The interconnect structure comprising a base portion formed on a mounting surface of a first component; a pillar portion extending from the base portion and substantially perpendicularly to the mounting surface; and a head portion formed on the pillar portion and having larger lateral dimensions than the pillar portion; wherein the base portion and the pillar portion are integrally formed of a homogeneous material.
Public/Granted literature
- US20100246150A1 Interconnect Structure And A Method Of Fabricating The Same Public/Granted day:2010-09-30
Information query