Invention Grant
- Patent Title: Method of manufacturing piezoelectric element and method of manufacturing liquid ejection head
- Patent Title (中): 制造压电元件的方法和制造液体喷射头的方法
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Application No.: US12400421Application Date: 2009-03-09
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Publication No.: US08474116B2Publication Date: 2013-07-02
- Inventor: Ryuji Tsukamoto
- Applicant: Ryuji Tsukamoto
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2008-059907 20080310
- Main IPC: H01L41/00
- IPC: H01L41/00 ; H04R17/00 ; B21D53/76 ; B23P17/00

Abstract:
A method of manufacturing a piezoelectric element, includes: a heating step of heating a piezoelectric film to a temperature not lower than a temperature at which a coercive electric field of the piezoelectric film becomes not higher than 0 V; an electric field application step of applying, to the piezoelectric film, an applied electric field in an opposite direction to a direction of orientation of the piezoelectric film while maintaining the temperature to which the piezoelectric film is heated in the heating step; and a temperature lowering step of lowering a temperature of the piezoelectric film to a temperature, in degrees Celsius, not higher than ⅓ of the Curie temperature while maintaining the applied electric field of a magnitude not lower than the coercive electric field applied to the piezoelectric film after the electric field application step, and then releasing the applied electric field applied to the piezoelectric film.
Public/Granted literature
- US20090223030A1 METHOD OF MANUFACTURING PIEZOELECTRIC ELEMENT AND METHOD OF MANUFACTURING LIQUID EJECTION HEAD Public/Granted day:2009-09-10
Information query
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