Invention Grant
- Patent Title: Method of manufacturing a liquid ejecting head
- Patent Title (中): 液体喷射头的制造方法
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Application No.: US12728907Application Date: 2010-03-22
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Publication No.: US08474139B2Publication Date: 2013-07-02
- Inventor: Xin-shan Li
- Applicant: Xin-shan Li
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2009-077864 20090326
- Main IPC: H04R17/00
- IPC: H04R17/00 ; B41J2/16

Abstract:
Provided is a method of manufacturing a liquid ejecting head, the method including forming a piezoelectric element having a width in a reference direction longer than a width in an orthogonal direction orthogonal to the reference direction on a first substrate, and adhering a second substrate to a surface of the first substrate opposed to the piezoelectric element at a temperature higher than a normal temperature, wherein, in the adhering of the second substrate, the second substrate is adhered such that the first direction of the second substrate is adjusted to the reference direction, using a first thermal expansion coefficient in a first direction on an adhesion surface with the first substrate greater than a second thermal expansion coefficient in a second direction orthogonal to the first direction and the first thermal expansion coefficient greater than a thermal expansion coefficient of the first substrate.
Public/Granted literature
- US20100245492A1 METHOD OF MANUFACTURING LIQUID EJECTING HEAD, LIQUID EJECTING HEAD, AND LIQUID EJECTING APPARATUS Public/Granted day:2010-09-30
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