Invention Grant
US08475042B1 Thermal shield system for high temperature environment XRF metrology tools 有权
用于高温环境XRF计量工具的热屏蔽系统

  • Patent Title: Thermal shield system for high temperature environment XRF metrology tools
  • Patent Title (中): 用于高温环境XRF计量工具的热屏蔽系统
  • Application No.: US12925366
    Application Date: 2010-10-20
  • Publication No.: US08475042B1
    Publication Date: 2013-07-02
  • Inventor: Francis Reilly
  • Applicant: Francis Reilly
  • Applicant Address: US NY Saugerties
  • Assignee: Ceres Technologies, Inc.
  • Current Assignee: Ceres Technologies, Inc.
  • Current Assignee Address: US NY Saugerties
  • Main IPC: H05G1/00
  • IPC: H05G1/00
Thermal shield system for high temperature environment XRF metrology tools
Abstract:
A thermal shield for an XRF measurement tool is formed from a heat shield and a heat shield cowling. These components protect the X-ray head assembly that includes the x-ray generation and detection columns and the head control electronics, communications and cooling systems. The heat shield is directly below the X-ray head, parallel to the x-ray head plane and plane of the PV substrate, and perpendicular to the primary beam output from the x-ray head. The heat shield is fabricated of machined copper with several ports machined through the shield. These ports provide a path for primary beam x-rays through the heat shield and for the return of fluoresced X-rays from the PV substrate back to the detector in the X-ray head, while preventing damage to the X-ray head due to the heat emitted from the PV substrate.
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