Invention Grant
- Patent Title: Method of manufacturing display device and display device
- Patent Title (中): 显示设备和显示设备的制造方法
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Application No.: US13086861Application Date: 2011-04-14
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Publication No.: US08475223B2Publication Date: 2013-07-02
- Inventor: Koichi Nagasawa
- Applicant: Koichi Nagasawa
- Applicant Address: JP Aichi
- Assignee: Japan Display West Inc.
- Current Assignee: Japan Display West Inc.
- Current Assignee Address: JP Aichi
- Agency: Dentons US LLP
- Priority: JP2010-112997 20100517
- Main IPC: H01J9/00
- IPC: H01J9/00

Abstract:
A method of manufacturing a display device includes the steps of: forming a positive type photoresist above a surface of a first transparent substrate having a transistor formed on the surface thereof so as to cover the transistor; radiating a light from a back surface side of the first transparent substrate to the first transparent substrate having the positive type photoresist formed thereabove, for exposing the positive type photoresist; developing the positive type photoresist thus exposed to selectively leave the positive type photoresist located above the transistor, for forming a spacer; and laminating a second transparent substrate above the surface of the first transparent substrate through the spacer.
Public/Granted literature
- US20110281491A1 METHOD OF MANUFACTURING DISPLAY DEVICE AND DISPLAY DEVICE Public/Granted day:2011-11-17
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