Invention Grant
- Patent Title: Polishing pad with partially recessed window
- Patent Title (中): 具有部分凹入窗口的抛光垫
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Application No.: US13106635Application Date: 2011-05-12
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Publication No.: US08475228B2Publication Date: 2013-07-02
- Inventor: Dominic J. Benvegnu , Boguslaw A. Swedek , Jimin Zhang
- Applicant: Dominic J. Benvegnu , Boguslaw A. Swedek , Jimin Zhang
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B7/22
- IPC: B24B7/22
Abstract:
A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.
Public/Granted literature
- US20110212673A1 POLISHING PAD WITH PARTIALLY RECESSED WINDOW Public/Granted day:2011-09-01
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