Invention Grant
US08475503B2 Methods for forming implants with selectively exposed mesh for fixation and related implants
有权
用于固定和相关植入物用选择性暴露的网格形成植入物的方法
- Patent Title: Methods for forming implants with selectively exposed mesh for fixation and related implants
- Patent Title (中): 用于固定和相关植入物用选择性暴露的网格形成植入物的方法
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Application No.: US12977336Application Date: 2010-12-23
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Publication No.: US08475503B2Publication Date: 2013-07-02
- Inventor: Guilhem Denoziere , Daniel Tomko , Anish Ghodadra
- Applicant: Guilhem Denoziere , Daniel Tomko , Anish Ghodadra
- Applicant Address: US GA Kennesaw
- Assignee: MiMedx Group, Inc.
- Current Assignee: MiMedx Group, Inc.
- Current Assignee Address: US GA Kennesaw
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Main IPC: A61B17/88
- IPC: A61B17/88

Abstract:
Methods for forming molded orthopedic implants with at least one mesh substrate having opposing upper and lower primary surfaces. At least a major portion of the mesh substrate lower primary surface is integrally moldably attached to the molded implant body. The methods are carried out so that the mesh substrate has at least one selectively exposed region devoid of molded material that exposes at least a portion of the mesh substrate upper surface to at least a partial thickness of the mesh substrate so as to allow for tissue in-growth in the at least one exposed region of the mesh substrate.
Public/Granted literature
- US20110089599A1 METHODS FOR FORMING IMPLANTS WITH SELECTIVELY EXPOSED MESH FOR FIXATION AND RELATED IMPLANTS Public/Granted day:2011-04-21
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