Invention Grant
- Patent Title: Gas purification apparatus and method
- Patent Title (中): 气体净化装置及方法
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Application No.: US13422668Application Date: 2012-03-16
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Publication No.: US08475562B2Publication Date: 2013-07-02
- Inventor: Tsuyoshi Moriya
- Applicant: Tsuyoshi Moriya
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-194811 20070726
- Main IPC: B03C3/68
- IPC: B03C3/68

Abstract:
A gas purification apparatus capable of removing fine particles of substantially any size without lowering the efficiency of gas supply. A loader module of a substrate processing apparatus includes a fan filter unit for producing a downward flow of atmospheric air in the internal space of a transfer chamber. The fan filter unit includes a fan for generating an atmospheric air flow, a filter of mesh structure for trapping and removing particles mixed in the atmospheric air flow, an irradiation heater disposed between the fan and the filter, and a high temperature part disposed in the atmospheric air flow and higher in temperature than the filter.
Public/Granted literature
- US20120174773A1 GAS PURIFICATION APPARATUS AND METHOD Public/Granted day:2012-07-12
Information query
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