Invention Grant
- Patent Title: Crystal preparing device, crystal preparing method, and crystal
- Patent Title (中): 晶体制备装置,晶体制备方法和晶体
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Application No.: US13170431Application Date: 2011-06-28
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Publication No.: US08475593B2Publication Date: 2013-07-02
- Inventor: Hirokazu Iwata , Seiji Sarayama , Akihiro Fuse
- Applicant: Hirokazu Iwata , Seiji Sarayama , Akihiro Fuse
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-068614 20060314; JP2006-078173 20060322
- Main IPC: C30B9/00
- IPC: C30B9/00 ; C30B11/00

Abstract:
In a crystal preparing device, a crucible holds a mixed molten metal containing alkali metal and group III metal. A container has a container space contacting the mixed molten metal and holds a molten alkali metal between the container space and an outside of the container, the molten alkali metal contacting the container space. A gas supply device supplies nitrogen gas to the container space. A heating device heats the crucible to a crystal growth temperature. The crystal preparing device is provided so that a vapor pressure of the alkali metal which evaporates from the molten alkali metal is substantially equal to a vapor pressure of the alkali metal which evaporates from the mixed molten metal.
Public/Granted literature
- US20110253034A1 CRYSTAL PREPARING DEVICE, CRYSTAL PREPARING METHOD, AND CRYSTAL Public/Granted day:2011-10-20
Information query
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