Invention Grant
US08475622B2 Method of reusing a consumable part for use in a plasma processing apparatus
有权
重复使用等离子体处理装置中的消耗部件的方法
- Patent Title: Method of reusing a consumable part for use in a plasma processing apparatus
- Patent Title (中): 重复使用等离子体处理装置中的消耗部件的方法
-
Application No.: US13524895Application Date: 2012-06-15
-
Publication No.: US08475622B2Publication Date: 2013-07-02
- Inventor: Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
- Applicant: Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2009-141317 20090612
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/306
Abstract:
A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.
Public/Granted literature
- US20120258258A1 METHOD OF REUSING A CONSUMABLE PART FOR USE IN A PLASMA PROCESSING APPARATUS Public/Granted day:2012-10-11
Information query
