Invention Grant
US08475668B2 Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored therein 有权
基板液体处理装置,基板液体处理方法和存储有基板液体处理程序的存储介质

Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored therein
Abstract:
Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.
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