Invention Grant
- Patent Title: Antireflection film and method for manufacturing the same
- Patent Title (中): 防反射膜及其制造方法
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Application No.: US12597743Application Date: 2008-04-16
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Publication No.: US08475916B2Publication Date: 2013-07-02
- Inventor: Kazufumi Ogawa
- Applicant: Kazufumi Ogawa
- Applicant Address: US DE Wilmington
- Assignee: Empire Technology Development LLC
- Current Assignee: Empire Technology Development LLC
- Current Assignee Address: US DE Wilmington
- Agency: Foley & Lardner LLP
- Priority: JP2007-119581 20070427
- International Application: PCT/JP2008/057425 WO 20080416
- International Announcement: WO2008/136267 WO 20081113
- Main IPC: B32B17/00
- IPC: B32B17/00 ; B32B5/16 ; B05D1/18

Abstract:
An antireflection film that requires neither a special vacuum chamber nor other expensive instruments and can be formed on a substrate of any size, and a method for manufacturing such an antireflection film are provided. The antireflection film is configured as follows: to the surface of a substrate coated with a film composed of a first film compound having a first functional group, is bound and fixed a layer of transparent fine particles through a bond formed by a coupling reaction between the first functional group and a first coupling reactive group of a first coupling agent that forms a film coating each of the transparent fine particles. Furthermore, alternating layers that consist of transparent fine particles each coated with a film composed of a film compound reactive with the first coupling reactive group and the reactive transparent fine particles may be bound and fixed thereonto.
Public/Granted literature
- US20100062240A1 ANTIREFLECTION FILM AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-03-11
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