Invention Grant
- Patent Title: Method of manufacturing color filter substrate
- Patent Title (中): 滤色片基板的制造方法
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Application No.: US13277593Application Date: 2011-10-20
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Publication No.: US08475979B2Publication Date: 2013-07-02
- Inventor: Hongtao Lin
- Applicant: Hongtao Lin
- Applicant Address: CN Beijing CN Chengdu
- Assignee: Boe Technology Group Co., Ltd.,Chengdu Boe Optoelectronics Technology Co., Ltd.
- Current Assignee: Boe Technology Group Co., Ltd.,Chengdu Boe Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Chengdu
- Agency: Ladas & Parry LLP
- Priority: CN201010520814 20101021
- Main IPC: G02B5/20
- IPC: G02B5/20

Abstract:
An embodiment of the present invention provides a method of manufacturing a color filter substrate, comprising: forming a black matrix on a base substrate; and forming color filter patterns having at least two colors on the base substrate on which the black matrix is formed, wherein forming a color filter pattern having one color of the at least two colors, comprising: forming a color filter resin layer having the one color on the base substrate on which the black matrix is formed; radiating the color filter resin layer from a side of the base substrate which is opposite to a side on which the black matrix is formed by using a mask to expose the color filter resin layer so as to form the color filter pattern, wherein light transmitting regions of the mask at least correspond to the color filter pattern to be formed.
Public/Granted literature
- US20120100471A1 METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE Public/Granted day:2012-04-26
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