Invention Grant
- Patent Title: Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
- Patent Title (中): 用于浸渍曝光的抗蚀组合物，形成抗蚀图案的方法和含氟聚合物
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Application No.: US13336131Application Date: 2011-12-23
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Publication No.: US08475997B2Publication Date: 2013-07-02
- Inventor: Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
- Applicant: Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
- Applicant Address: JP Kanagawa-ken
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPP2008-163861 20080623
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30
Abstract:
A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
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