Invention Grant
- Patent Title: Method of fabricating patterned CZT and CdTe devices
- Patent Title (中): 制造图案化CZT和CdTe器件的方法
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Application No.: US12654646Application Date: 2009-12-28
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Publication No.: US08476101B2Publication Date: 2013-07-02
- Inventor: Henry Chen , Pramodha Marthandam , Salah Awadalla , Pinghe Lu
- Applicant: Henry Chen , Pramodha Marthandam , Salah Awadalla , Pinghe Lu
- Applicant Address: CA Sidney
- Assignee: Redlen Technologies
- Current Assignee: Redlen Technologies
- Current Assignee Address: CA Sidney
- Agency: The Marbury Law Group PLLC
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of making a semiconductor radiation detector includes the steps of providing a semiconductor substrate having front and rear major opposing surfaces, forming a solder mask layer over the rear major surface, patterning the solder mask layer into a plurality of pixel separation regions, and after the step of patterning the solder mask layer, forming anode pixels over the rear major surface. Each anode pixel is formed between adjacent pixel-separation regions and a cathode electrode is located over the front major surface of the substrate. The solder mask can be used as a permanent photoresist in developing patterned electrodes on CdZnTe/CdTe devices as well as a permanent reliability protection coating. The method is very robust and ensures long-term reliability, outstanding detector performance, and may be used in applications such as medical imaging and for demanding other highly spectroscopic applications.
Public/Granted literature
- US20110156198A1 Method of fabricating patterned CZT and CdTe devices Public/Granted day:2011-06-30
Information query
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