Invention Grant
US08476136B2 Method and a structure for enhancing electrical insulation and dynamic performance of MIS structures comprising vertical field plates 有权
包括垂直场板的MIS结构的电绝缘和动态性能的方法和结构

Method and a structure for enhancing electrical insulation and dynamic performance of MIS structures comprising vertical field plates
Abstract:
In an MIS structure a field plate electrode is incorporated below a buried gate electrode by using an insulating oxide layer, which is formed concurrently with the gate dielectric layer. In order to obtain superior dynamic behavior and enhanced dielectric strength the oxidation behavior of the field plate electrode is modified, for instance by incorporating a desired high concentration of arsenic.
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