Invention Grant
- Patent Title: Fine pattern transfer material
- Patent Title (中): 精细图案转印材料
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Application No.: US12523464Application Date: 2008-02-07
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Publication No.: US08476361B2Publication Date: 2013-07-02
- Inventor: Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
- Applicant: Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
- Applicant Address: JP Tokyo
- Assignee: Showa Denko K.K.
- Current Assignee: Showa Denko K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-030805 20070209
- International Application: PCT/JP2008/052476 WO 20080207
- International Announcement: WO2008/099903 WO 20080821
- Main IPC: C08L83/04
- IPC: C08L83/04

Abstract:
A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.
Public/Granted literature
- US20100093907A1 Fine Pattern Transfer Material Public/Granted day:2010-04-15
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