Invention Grant
US08476621B2 Resin composition, gate insulating layer, and organic thin film transistor 有权
树脂组合物,栅极绝缘层和有机薄膜晶体管

  • Patent Title: Resin composition, gate insulating layer, and organic thin film transistor
  • Patent Title (中): 树脂组合物,栅极绝缘层和有机薄膜晶体管
  • Application No.: US13060456
    Application Date: 2009-08-25
  • Publication No.: US08476621B2
    Publication Date: 2013-07-02
  • Inventor: Isao Yahagi
  • Applicant: Isao Yahagi
  • Applicant Address: JP Tokyo
  • Assignee: Sumitomo Chemical Company, Limited
  • Current Assignee: Sumitomo Chemical Company, Limited
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2008-219846 20080828; JP2009-027625 20090209; JP2009-168912 20090717
  • International Application: PCT/JP2009/064768 WO 20090825
  • International Announcement: WO2010/024238 WO 20100304
  • Main IPC: H01L35/24
  • IPC: H01L35/24
Resin composition, gate insulating layer, and organic thin film transistor
Abstract:
The subject of the present invention is to provide an organic thin film transistor with a small hysteresis. The means for solving the subject is a resin composition for an organic thin film transistor gate insulating layer comprising (A) a macromolecule that comprises at least one repeating unit selected from the group consisting of repeating units represented by Formula (1), repeating units represented by Formula (1′), and repeating units represented by Formula (2) and contains two or more first functional groups in its molecule, wherein the first functional group is a functional group that generates, by the action of electromagnetic waves or heat, a second functional group that reacts with active hydrogen, and (B) at least one compound selected from the group consisting of low-molecular compounds containing two or more active hydrogens in each molecule and macromolecules containing two or more active hydrogens in each molecule.
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