Invention Grant
- Patent Title: Three-dimensional semiconductor device structures and methods
- Patent Title (中): 三维半导体器件的结构和方法
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Application No.: US13212175Application Date: 2011-08-18
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Publication No.: US08476703B2Publication Date: 2013-07-02
- Inventor: Qi Wang
- Applicant: Qi Wang
- Applicant Address: US ME South Portland
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US ME South Portland
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A three-dimensional semiconductor device includes a first semiconductor device, a second semiconductor device, and a patterned conductive layer disposed between the first and the second semiconductor devices. The first semiconductor device has a first plurality of terminals on a front side of the first semiconductor device and a first metal substrate on its back side, wherein one of the first plurality of terminals in the first semiconductor device is electrically coupled to the first metal substrate. The second semiconductor device has a second plurality of terminals on a front side of the second semiconductor device and a second metal substrate on its back side, wherein the second semiconductor device further includes a second metal substrate on its back side. The patterned conductive layer includes a plurality of conductive regions. Each of the conductive regions is bonded to a conductor coupled to one of the first plurality of terminals and another conductor coupled to one of the second plurality of terminals.
Public/Granted literature
- US20110298047A1 THREE-DIMENSIONAL SEMICONDUCTOR DEVICE STRUCTURES AND METHODS Public/Granted day:2011-12-08
Information query
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