Invention Grant
- Patent Title: RF MEMS switch device and manufacturing method thereof
- Patent Title (中): RF MEMS开关器件及其制造方法
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Application No.: US13089819Application Date: 2011-04-19
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Publication No.: US08476995B2Publication Date: 2013-07-02
- Inventor: Kwang-Jae Shin
- Applicant: Kwang-Jae Shin
- Applicant Address: KR Gyeonggi-Do
- Assignee: MEMS Solution Inc.
- Current Assignee: MEMS Solution Inc.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Finnegan Henderson Farabow Garrett & Dunner LLP
- Priority: KR10-2011-0032888 20110408
- Main IPC: H01H51/22
- IPC: H01H51/22

Abstract:
The present invention relates to an RF MEMS switch device comprising: a substrate; a bias electrode positioned on the substrate and supplying bias voltage; a pair of signal electrodes positioned to be spaced-apart each other on the substrate and transmitting an RF signal from one side to the other side; a dielectric layer formed on upper part of the pair of signal electrodes to be overlapped with the pair of signal electrodes; a membrane electrode formed on the dielectric layer to be overlapped with the pair of signal electrodes and the dielectric layer; a bias line connecting between the membrane electrode and the bias electrode; at least one pooling electrode formed to be overlapped with the membrane electrode and having the dielectric layer be interposed therebetween; and a pooling line connecting any one of the pair of signal electrodes and the pooling electrode, and manufacturing method thereof.
Public/Granted literature
- US20120255841A1 RF MEMS SWITCH DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-10-11
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