Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US11798127Application Date: 2007-05-10
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Publication No.: US08477283B2Publication Date: 2013-07-02
- Inventor: Yasufumi Nishii
- Applicant: Yasufumi Nishii
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-131280 20060510
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus comprises a first member, which is arranged so as to oppose a surface of a substrate, and between which and the surface of the substrate a liquid immersion space is formed; and a second member, which traps liquid that is present at the surface of the substrate. A distance between the second member and the substrate is smaller than a distance between the first member and the substrate.
Public/Granted literature
- US20070296939A1 Exposure apparatus and device manufacturing method Public/Granted day:2007-12-27
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