Invention Grant
- Patent Title: Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus
- Patent Title (中): 基板处理装置,基板处理系统和检查/周边曝光装置
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Application No.: US12870402Application Date: 2010-08-27
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Publication No.: US08477301B2Publication Date: 2013-07-02
- Inventor: Masahito Kashiyama , Yukihiko Inagaki , Kazuya Akiyama , Noriaki Yokono , Isao Taniguchi
- Applicant: Masahito Kashiyama , Yukihiko Inagaki , Kazuya Akiyama , Noriaki Yokono , Isao Taniguchi
- Applicant Address: JP
- Assignee: Sokudo Co., Ltd.
- Current Assignee: Sokudo Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2009-213093 20090915
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.
Public/Granted literature
- US20110063588A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND INSPECTION/PERIPHERY EXPOSURE APPARATUS Public/Granted day:2011-03-17
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