Invention Grant
US08477301B2 Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus 有权
基板处理装置,基板处理系统和检查/周边曝光装置

Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus
Abstract:
An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.
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