Invention Grant
US08477304B2 System and method for high precision isotope ratio destructive analysis
有权
高精度同位素比破坏性分析的系统和方法
- Patent Title: System and method for high precision isotope ratio destructive analysis
- Patent Title (中): 高精度同位素比破坏性分析的系统和方法
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Application No.: US13050546Application Date: 2011-03-17
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Publication No.: US08477304B2Publication Date: 2013-07-02
- Inventor: Bruce A. Bushaw , Norman C. Anheier , Jon R. Phillips
- Applicant: Bruce A. Bushaw , Norman C. Anheier , Jon R. Phillips
- Applicant Address: US WA Richland
- Assignee: Battelle Memorial Institute
- Current Assignee: Battelle Memorial Institute
- Current Assignee Address: US WA Richland
- Agent James D. Matheson; Derek H. Maughan
- Main IPC: G01J3/30
- IPC: G01J3/30

Abstract:
A system and process are disclosed that provide high accuracy and high precision destructive analysis measurements for isotope ratio determination of relative isotope abundance distributions in liquids, solids, and particulate samples. The invention utilizes a collinear probe beam to interrogate a laser ablated plume. This invention provides enhanced single-shot detection sensitivity approaching the femtogram range, and isotope ratios that can be determined at approximately 1% or better precision and accuracy (relative standard deviation).
Public/Granted literature
- US20110164248A1 SYSTEM AND METHOD FOR HIGH PRECISION ISOTOPE RATIO DESTRUCTIVE ANALYSIS Public/Granted day:2011-07-07
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