Invention Grant
- Patent Title: Liquid processing apparatus and method
- Patent Title (中): 液体处理装置及方法
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Application No.: US11808855Application Date: 2007-06-13
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Publication No.: US08479753B2Publication Date: 2013-07-09
- Inventor: Hiromitsu Nanba , Norihiro Ito
- Applicant: Hiromitsu Nanba , Norihiro Ito
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-167972 20060616
- Main IPC: B08B3/00
- IPC: B08B3/00

Abstract:
A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.
Public/Granted literature
- US20070289528A1 Liquid processing apparatus and method Public/Granted day:2007-12-20
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