Invention Grant
- Patent Title: Donor film for laser induced thermal imaging method, light emitting device using the same, and method of manufacturing light emitting device
- Patent Title (中): 用于激光诱导热成像方法的供体膜,使用其的发光装置和制造发光器件的方法
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Application No.: US12890226Application Date: 2010-09-24
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Publication No.: US08480448B2Publication Date: 2013-07-09
- Inventor: Nam-Choul Yang , Lian Duan , Mu-Hyun Kim , Seong-Taek Lee
- Applicant: Nam-Choul Yang , Lian Duan , Mu-Hyun Kim , Seong-Taek Lee
- Applicant Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2005-0083889 20050908
- Main IPC: H01J9/00
- IPC: H01J9/00

Abstract:
A donor film for a laser induced thermal imaging method capable of improving the optical efficiency of an emission layer, a light emitting device using the same, and a method of manufacturing the light emitting device are provided. The donor film for a laser induced thermal imaging method includes a base substrate, a light to heat conversion layer (LTHC) provided on the base substrate and having a pattern with a predetermined step difference, and a transfer layer provided on the LTHC. It is possible to improve the optical efficiency of the emission layer by patterning the transfer layer using the LTHC having the pattern with a predetermined step difference.
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