Invention Grant
- Patent Title: Processing system
- Patent Title (中): 处理系统
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Application No.: US12309974Application Date: 2008-01-28
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Publication No.: US08480847B2Publication Date: 2013-07-09
- Inventor: Yoshifumi Amano
- Applicant: Yoshifumi Amano
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2007-022618 20070201
- International Application: PCT/JP2008/051156 WO 20080128
- International Announcement: WO2008/093624 WO 20080807
- Main IPC: H01L21/306
- IPC: H01L21/306

Abstract:
A processing system adapted for processing an object to be processed, including a processing vessel configured for containing the object to be processed and for receiving a processing fluid, a processing fluid generating unit configured for generating a processing fluid, a processing-side fluid passage configured for supplying the processing fluid into the processing vessel, and a discharge fluid passage configured for discharging the processing fluid from the processing vessel. The processing system further includes a bypass-side fluid passage configured for discharging the processing fluid generated in the processing fluid generating unit without passing it through the processing vessel, a pressure control mechanism provided to the discharge fluid passage downstream from a position at which the bypass-side fluid passage is connected with the discharge fluid passage, and a switch valve configured to selectively switch a fluid passage of the processing fluid between the processing-side fluid passage and the bypass-side fluid passage.
Public/Granted literature
- US20100000682A1 PROCESSING SYSTEM Public/Granted day:2010-01-07
Information query
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