Invention Grant
- Patent Title: Analytical pretreatment device
- Patent Title (中): 分析预处理装置
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Application No.: US11791835Application Date: 2005-11-30
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Publication No.: US08480970B2Publication Date: 2013-07-09
- Inventor: Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
- Applicant: Hiroshi Kawazoe , Kunihiko Akai , Kiyoshi Yasue
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Co., Ltd.
- Current Assignee: Hitachi Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman Hattori Daniels & Adrian, LLP
- Priority: JP2004-346020 20041130; JP2005-188193 20050628
- International Application: PCT/JP2005/022002 WO 20051130
- International Announcement: WO2006/059649 WO 20060608
- Main IPC: B01L3/00
- IPC: B01L3/00

Abstract:
The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
Public/Granted literature
- US20080124242A1 Analytical Pretreatment Device Public/Granted day:2008-05-29
Information query
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