Invention Grant
- Patent Title: Dichroic filters formed using silicon carbide based layers
- Patent Title (中): 使用碳化硅基层形成的二向色滤光片
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Application No.: US12597764Application Date: 2008-08-06
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Publication No.: US08481109B2Publication Date: 2013-07-09
- Inventor: Ludmil M. Zambov , Vasgen A. Shamamian , Jeffrey A. Seifferly , Susan V. Perz
- Applicant: Ludmil M. Zambov , Vasgen A. Shamamian , Jeffrey A. Seifferly , Susan V. Perz
- International Application: PCT/US2008/072260 WO 20080806
- International Announcement: WO2009/023482 WO 20090219
- Main IPC: B05B5/00
- IPC: B05B5/00 ; B05B5/06
Abstract:
The present invention provides a method of forming a flexible dichroic optical filter. The method comprises depositing a plurality of pairs of layers adjacent a substrate. Each of the plurality of pairs of layers includes a first layer formed of a silicon-and-carbon containing material having a first index of refraction and a second layer formed of a silicon-and-carbon containing material having a second index of refraction that is different than the first index of refraction.
Public/Granted literature
- US20100284088A1 DICHROIC FILTERS FORMED USING SILICON CARBIDE BASED LAYERS Public/Granted day:2010-11-11
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