Invention Grant
- Patent Title: Bisamineazaallylic ligands and their use in atomic layer deposition methods
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Application No.: US13189644Application Date: 2011-07-25
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Publication No.: US08481119B2Publication Date: 2013-07-09
- Inventor: David Thompson , Jeffrey W. Anthis
- Applicant: David Thompson , Jeffrey W. Anthis
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C07F11/00 ; H01L21/31
Abstract:
Methods for deposition of elemental metal films on surfaces using metal coordination complexes comprising bisamineazaallylic ligands are provided. Also provided are bisamineazaallylic ligands useful in the methods of the invention and metal coordination complexes comprising these ligands.
Public/Granted literature
- US20120107502A1 Bisamineazaallylic Ligands And Their Use In Atomic Layer Deposition Methods Public/Granted day:2012-05-03
Information query
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