Invention Grant
US08481120B2 Method for coating a substrate and metal alloy vacuum deposition facility
有权
涂覆基材和金属合金真空沉积设备的方法
- Patent Title: Method for coating a substrate and metal alloy vacuum deposition facility
- Patent Title (中): 涂覆基材和金属合金真空沉积设备的方法
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Application No.: US12532043Application Date: 2008-03-19
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Publication No.: US08481120B2Publication Date: 2013-07-09
- Inventor: Patrick Choquet , Eric Silberberg , Bruno Schmitz , Daniel Chaleix
- Applicant: Patrick Choquet , Eric Silberberg , Bruno Schmitz , Daniel Chaleix
- Applicant Address: FR Saint Denis
- Assignee: ArcelorMittal France
- Current Assignee: ArcelorMittal France
- Current Assignee Address: FR Saint Denis
- Agency: Davidson, Davidson & Kappel, LLC
- Priority: EP07290342 20070320
- International Application: PCT/FR2008/000347 WO 20080319
- International Announcement: WO2008/142222 WO 20081127
- Main IPC: B05D3/00
- IPC: B05D3/00 ; C23C16/00

Abstract:
The invention relates to a process for coating a substrate (S) whereby a metal alloy layer comprising at least two metallic elements is continuously deposited on the substrate (S) by means of a vacuum deposition facility (1) comprising a vapor jet coater (7) for spraying the substrate (S) with a vapor containing the metallic elements in a constant and predetermined relative content, the vapor being sprayed at a sonic velocity. The process is more particularly intended for depositing Zn—Mg coatings.The invention also relates to a vacuum deposition facility (1) for continuously depositing coatings formed from metal alloys, for implementing the process.
Public/Granted literature
- US20100104752A1 METHOD FOR COATING A SUBSTRATE AND METAL ALLOY VACUUM DEPOSITION FACILITY Public/Granted day:2010-04-29
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