Invention Grant
- Patent Title: Methods of forming material over substrates
- Patent Title (中): 在基材上形成材料的方法
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Application No.: US11485658Application Date: 2006-07-12
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Publication No.: US08481122B2Publication Date: 2013-07-09
- Inventor: Chris M. Carlson , Vishwanath Bhat , F. Daniel Gealy
- Applicant: Chris M. Carlson , Vishwanath Bhat , F. Daniel Gealy
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: C23C16/40
- IPC: C23C16/40

Abstract:
ALD-type methods which include providing two or more different precursors within a chamber at different and substantially non-overlapping times relative to one another to form a material, and thereafter exposing the material to one or more reactants to change a composition of the material. In particular aspects, the precursors utilized to form the material are metal-containing precursors, and the reactant utilized to change the composition of the material comprises oxygen, silicon, and/or nitrogen.
Public/Granted literature
- US20060251813A1 Methods of forming material over substrates Public/Granted day:2006-11-09
Information query
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