Invention Grant
- Patent Title: Method for manufacturing semiconductor light emitting device
- Patent Title (中): 半导体发光元件的制造方法
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Application No.: US12115906Application Date: 2008-05-06
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Publication No.: US08481349B2Publication Date: 2013-07-09
- Inventor: Mitsunori Harada
- Applicant: Mitsunori Harada
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kenealy Vaidya LLP
- Priority: JP2004-291278 20041004
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a semiconductor light emitting device can result in a device that includes a housing having a cavity, a light emitting element on a bottom face of the cavity, and a wavelength conversion layer provided within the cavity. The wavelength conversion layer can include particles of a wavelength conversion material. The method includes forming the wavelength conversion layer within the cavity, which can include applying and hardening a first material to form a first wavelength conversion layer on the light emitting element, and applying and hardening a second material to substantially fill the remainder of the entire cavity, thereby forming a second wavelength conversion layer. The semiconductor light emitting device manufactured by the inventive method can achieve uniform light emitting characteristics without substantially any uneven color and can include high heat dissipation efficiency.
Public/Granted literature
- US20080213928A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2008-09-04
Information query
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