Invention Grant
- Patent Title: Asymmetric wedge JFET, related method and design structure
- Patent Title (中): 非对称楔形JFET,相关方法和设计结构
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Application No.: US12888828Application Date: 2010-09-23
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Publication No.: US08481380B2Publication Date: 2013-07-09
- Inventor: Xuefeng Liu , Richard A. Phelps , Robert M. Rassel , Xiaowei Tian
- Applicant: Xuefeng Liu , Richard A. Phelps , Robert M. Rassel , Xiaowei Tian
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Anthony J. Canale
- Main IPC: H01L21/337
- IPC: H01L21/337

Abstract:
A junction gate field-effect transistor (JFET) for an integrated circuit (IC) chip is provided comprising a source region, a drain region, a lower gate, and a channel, with an insulating shallow trench isolation (STI) region extending from an inner edge of an upper surface of the source region to an inner edge of an upper surface of the drain region, without an intentionally doped region, e.g., an upper gate, coplanar with an upper surface of the IC chip between the source/drain regions. In addition, an asymmetrical quasi-buried upper gate can be included, disposed under a portion of the STI region, but not extending under a portion of the STI region proximate to the drain region. Embodiments of this invention also include providing an implantation layer, under the source region, to reduce Ron. A related method and design structure are also disclosed.
Public/Granted literature
- US20120074469A1 ASYMMETRIC WEDGE JFET, RELATED METHOD AND DESIGN STRUCTURE Public/Granted day:2012-03-29
Information query
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