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US08481386B2 Nanocrystal memories and methods of forming the same 有权
纳米晶体记忆及其形成方法

Nanocrystal memories and methods of forming the same
Abstract:
In one embodiment, a memory device includes a substrate, a tunneling oxide, a silicide nanocrystal floating gate, and a control oxide. The tunneling oxide is positioned upon a first surface of the substrate, the silicide nanocrystal floating gate is positioned upon the tunneling oxide, and the control oxide positioned upon the nanocrystal floating gate.
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