Invention Grant
- Patent Title: Method to form a photovoltaic cell comprising a thin lamina
- Patent Title (中): 形成包括薄层的光伏电池的方法
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Application No.: US12026530Application Date: 2008-02-05
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Publication No.: US08481845B2Publication Date: 2013-07-09
- Inventor: Srinivasan Sivaram , Aditya Agarwal , S. Brad Herner , Christopher J. Petti
- Applicant: Srinivasan Sivaram , Aditya Agarwal , S. Brad Herner , Christopher J. Petti
- Applicant Address: US NH Nashua
- Assignee: GTAT Corporation
- Current Assignee: GTAT Corporation
- Current Assignee Address: US NH Nashua
- Agency: The Mueller Law Office, P.C.
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L21/00
Abstract:
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
Public/Granted literature
- US20090194162A1 METHOD TO FORM A PHOTOVOLTAIC CELL COMPRISING A THIN LAMINA Public/Granted day:2009-08-06
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