Invention Grant
US08482029B2 Semiconductor device and integrated circuit including the semiconductor device 有权
包括半导体器件的半导体器件和集成电路

Semiconductor device and integrated circuit including the semiconductor device
Abstract:
A semiconductor device includes a source metallization and a semiconductor body. The semiconductor body includes a first field-effect structure including a source region of a first conductivity type electrically coupled to the source metallization. The semiconductor body also includes a second field-effect structure including a source region of the first conductivity type electrically coupled to the source metallization. A voltage tap including a semiconductor region within the semiconductor body is electrically coupled to a first gate electrode of the first field-effect structure by an intermediate inverter structure.
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