Invention Grant
- Patent Title: Insulated gate bipolar transistor and manufacturing method thereof
- Patent Title (中): 绝缘栅双极晶体管及其制造方法
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Application No.: US13226995Application Date: 2011-09-07
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Publication No.: US08482030B2Publication Date: 2013-07-09
- Inventor: Shinji Aono , Tadaharu Minato
- Applicant: Shinji Aono , Tadaharu Minato
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-280112 20101216; JP2011-063564 20110323
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L21/331

Abstract:
A trench gate IGBT designed to reduce on-state voltage while maintaining the withstand voltage, including a first drift layer formed on a first main surface of a buffer layer, a second drift layer of the first conductivity type formed on said first drift layer, a base layer of a second conductivity type formed on the second drift layer, an emitter layer of the first conductivity type selectively formed in the surface of the base layer, and a gate electrode buried from the surface of the emitter layer through into the second drift layer with a gate insulating film therebetween, wherein said first drift layer has a structure in which a first layer of the first conductivity type and a second layer of the second conductivity type are repeated in a horizontal direction.
Public/Granted literature
- US20120153348A1 INSULATED GATE BIPOLAR TRANSISTOR AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-06-21
Information query
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