Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13317168Application Date: 2011-10-12
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Publication No.: US08482102B2Publication Date: 2013-07-09
- Inventor: Hiroki Fujii
- Applicant: Hiroki Fujii
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2010-245828 20101102
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A semiconductor device in which only the trigger voltage can be controlled without change in the hold voltage. In the semiconductor device, a protection device includes a lower doped collector layer, a sinker layer, a highly-doped collector layer, an emitter layer, a highly-doped base layer, a base layer, a first conductivity type layer, and a second conductivity type layer. The second conductivity type layer is formed in the lower doped collector layer and located between the base layer and first conductivity type layer. The second conductivity type layer has a higher impurity concentration than the lower doped collector layer.
Public/Granted literature
- US20120104553A1 Semiconductor device Public/Granted day:2012-05-03
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