Invention Grant
- Patent Title: RF switch with high isolation performance
- Patent Title (中): 射频开关具有高隔离性能
-
Application No.: US12681307Application Date: 2008-06-26
-
Publication No.: US08482360B2Publication Date: 2013-07-09
- Inventor: Dong-Pil Chang , In-Bok Yom
- Applicant: Dong-Pil Chang , In-Bok Yom
- Applicant Address: KR Daejon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2007-0098738 20071001
- International Application: PCT/KR2008/003703 WO 20080626
- International Announcement: WO2009/044989 WO 20090409
- Main IPC: H01P1/10
- IPC: H01P1/10 ; H01P5/12

Abstract:
Provided is a RF switch for switching a path of a RF signal using a semiconductor transistor such as a field effect transistor (FET). The RF switch includes a plurality of resonators connected to a RF transmission line, and at least one of switching elements connected in shunt or in series between the plural of resonators. The plurality of resonators resonate by interacting with the switching elements when the switching elements are shorted or open.
Public/Granted literature
- US20100244985A1 RF Switch with High Isolation Performance Public/Granted day:2010-09-30
Information query