Invention Grant
- Patent Title: Image sensing device and camera
- Patent Title (中): 影像传感装置及相机
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Application No.: US13139558Application Date: 2010-01-20
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Publication No.: US08482646B2Publication Date: 2013-07-09
- Inventor: Takanori Watanabe , Mineo Shimotsusa , Takeshi Ichikawa , Hajime Ikeda , Yasuhiro Sekine , Akira Ohtani , Takeshi Kojima
- Applicant: Takanori Watanabe , Mineo Shimotsusa , Takeshi Ichikawa , Hajime Ikeda , Yasuhiro Sekine , Akira Ohtani , Takeshi Kojima
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2009-026699 20090206; JP2009-293211 20091224
- International Application: PCT/JP2010/050998 WO 20100120
- International Announcement: WO2010/090104 WO 20100812
- Main IPC: H04N3/14
- IPC: H04N3/14 ; H04N5/335 ; C12Q1/68 ; H01J40/00 ; H01L29/04 ; H01L29/10 ; H01L31/00

Abstract:
An image sensing device comprises a pixel array, and a peripheral circuit, a column selecting circuit, and a readout, wherein each pixel includes a photodiode, a floating diffusion, a transfer PMOS transistor to the floating diffusion, an amplifier PMOS transistor, and a reset PMOS transistor, the amplifier PMOS transistor has a gate which is formed by an n-type conductive pattern, and is isolated by a first element isolation region and an n-type impurity region which covers at least a lower portion of the first element isolation region, and each PMOS transistor included in the column selecting circuit has a gate which is formed by a p-type conductive pattern and is isolated by a second element isolation region, and an n-type impurity concentration in a region adjacent to a lower portion of the second element isolation region is lower than that in the n-type impurity region.
Public/Granted literature
- US20110242388A1 IMAGE SENSING DEVICE AND CAMERA Public/Granted day:2011-10-06
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