Invention Grant
- Patent Title: Alignment system for various materials and material flows
- Patent Title (中): 各种材料和材料流动的校准系统
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Application No.: US13041622Application Date: 2011-03-07
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Publication No.: US08482732B2Publication Date: 2013-07-09
- Inventor: Hans Dohse
- Applicant: Hans Dohse
- Applicant Address: US CA San Jose
- Assignee: Maskless Lithography, Inc.
- Current Assignee: Maskless Lithography, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Schneck & Schneck
- Agent Thomas Schneck
- Main IPC: G01B11/00
- IPC: G01B11/00

Abstract:
A method and system for alignment of a tool to a workpiece in a continuous or discontinuous material flow are disclosed. The workpiece may be a portion of a web of material. An imaging system captures first and second images of the workpiece at first and second occasions respectively. Microscopic native features of the workpiece are selected, detected, tracked and/or compared in the first and second images. Based on the correspondence between, tracking or relative displacement of features as captured in the first and second images, an alignment to the workpiece is controlled. In embodiments, the workpiece and a tool, a projected image or a pattern to be imparted to the workpiece by a lithography or photolithography apparatus are aligned based upon positioning information determined from an analysis of correlated features or texture in the images. Positioning information may include a positioning error or a distortion indication.
Public/Granted literature
- US20110157577A1 ALIGNMENT SYSTEM FOR VARIOUS MATERIALS AND MATERIAL FLOWS Public/Granted day:2011-06-30
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