Invention Grant
- Patent Title: MEMS device and method of manufacturing the same
- Patent Title (中): MEMS器件及其制造方法
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Application No.: US12918783Application Date: 2009-03-02
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Publication No.: US08482843B2Publication Date: 2013-07-09
- Inventor: Shingo Uchiyama , Fusao Shimokawa , Tomomi Sakata , Nobuhiro Shimoyama , Mitsuhiro Makihara , Mitsuo Usui
- Applicant: Shingo Uchiyama , Fusao Shimokawa , Tomomi Sakata , Nobuhiro Shimoyama , Mitsuhiro Makihara , Mitsuo Usui
- Applicant Address: JP Tokyo
- Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee Address: JP Tokyo
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Priority: JP2008-049520 20080229; JP2008-166950 20080626; JP2008-166953 20080626; JP2008-166955 20080626; JP2008-181451 20080711
- International Application: PCT/JP2009/053892 WO 20090302
- International Announcement: WO2009/107835 WO 20090903
- Main IPC: G02B26/00
- IPC: G02B26/00
Abstract:
A MEMS device includes a mirror substrate (200), an electrode substrate (301) arranged so as to face the mirror substrate (200), a mirror (230) serving as a movable member rotatably supported in an opening portion of the mirror substrate (200) via support members, a driving electrode (101) arranged on an insulating film (104) on a surface of the electrode substrate (301) facing the mirror substrate (200) so as to face the mirror (230) across a gap and drive the mirror (230), and a lower electrode (103) made of a metal or a semiconductor and formed under the insulating film (104) exposed to the gap so as to be in contact with the insulating film (104).
Public/Granted literature
- US20110013256A1 MEMS DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-01-20
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